Nitrogen Trifluoride
三氟化氮(NF3)，是一種無色、無臭、性質穩定的氣體，是一種強氧化劑。三氟化氮熔點為-206.8℃，沸點為-129.0℃，不溶于水。三氟化氮在微電子工業中作為一種優良的等離子蝕刻氣體，在等離子蝕刻時裂解為活性氟離子，對硅和氮化硅蝕刻時，采用三氟化氮比四氟化碳和四氟化碳與氧氣的混合氣體有更高的蝕刻速率和選擇性，尤其是在厚度小于1.5μm的集成電路材料的蝕刻中，三氟化氮具有非常優異的蝕刻速率和選擇性，在被蝕刻物表面不留任何殘留物，同時也是非常良好的清洗劑。
Nitrogen trifluoride (NF3) is a kind of colorless, odorless and character stable gas, it is also a kind of strong oxidant. Its melting point is 206.8 ℃, boiling point is 129.0 ℃, insoluble in water. Nitrogen trifluoride in the microelectronics industry is a kind of excellent plasma etching gas, which is cracked into active fluorine ion during the process of plasma etching. For the plasma etching of silicon and silicon nitride, using nitrogen trifluoride has higher etching rate and selectivity than using of carbon tetrafluoride or carbon tetrafluoride and oxygen mixed gas, especially in the process of etching integrated circuit material with the thickness of less than 1.5 μm, nitrogen trifluoride has excellent etching rate and selectivity, what's more, there is no pollution on the surface of etched material, it is also a good cleaning agent.
| 項目 Items | 單位 Unit | 指標 Indexs | ||||
| 三氟化氮（NF3）≥ | Vol.% | 99.5 | 99.9 | 99.98 | 99.99 | 99.996 |
| 四氟化碳（CF4）≤ | Vol.ppm | 1500 | 500 | 100 | 50 | 20 |
| 氮氣（N2）≤ | Vol.ppm | 700 | 50 | 10 | 10 | 5 |
| 氧加氬（O2+Ar））≤ | Vol.ppm | 700 | 50 | 10 | 5 | 3 |
| 一氧化碳（CO）≤ | Vol.ppm | 50 | 10 | 10 | 5 | 1 |
| 二氧化碳（CO2）≤ | Vol.ppm | 25 | 10 | 10 | 5 | 0.5 |
| 氧化亞氮（N2O）≤ | Vol.ppm | 50 | 10 | 10 | 5 | 1 |
| 六氟化硫（SF6）≤ | Vol.ppm | 50 | 50 | 10 | 5 | 2 |
| 可水解氟化物 Hydrolyzable fluoride （Measured by HF）≤ | Vol.ppm | 1 | 1 | 1 | 1 | 1 |
| 水（H2O）≤ | Vol.ppm | 1 | 1 | 1 | 1 | 1 |
三氟化氮可用作高能化學激光氣的氟源，又可用于多晶硅、氮化硅、硅化鎢等半導體材料的蝕刻劑。其亦可用作半導體芯片生產的化學氣相沉積室和液晶顯示器面板的清洗劑，使用三氟化氮作為CVD箱清洗劑，與全氟烴相比，可減少污染物排放量約90%，且可顯著提高清洗速度，提升清洗能力。
Nitrogen trifluoride can be used as fluorine source of high energy chemical laser gas and as etching agent for semiconductor materials such as polysilicon, silicon nitride and tungsten silicide. It can also be used as a cleaning agent for chemical vapor deposition chamber and LCD panel. Nitrogen trifluoride is used as a cleaning agent for CVD box, which can reduce pollutant emission by 90% compared with perfluorocarbons, and significantly improve the cleaning speed and cleaning capacity.
三氟化氮充裝在鋼質無縫氣瓶中，鋼瓶容積分別為8L、40L、43.3L、47L；鋼瓶壓力為9.0-13.0MPa。具體包裝規格可根據用戶需求定制更改。
Nitrogen trifluoride is filled in a steel seamless cylinder with the volume of 8L, 40L, 43.3L and 47L, respectively. The pressure of cylinder is 9.0-13.0MPa. Packaging specifications can be customized according to customers' requirements.
